Applied Materials Announced Commercial Availability of Cold Field Emission Technology in Development of Advanced Computer Chips
Applied Materials, Inc. today announced the commercial availability of "cold field emission" (CFE) technology, a breakthough in eBeam imaging that enables customers to better detect and image nanometer-scale, buried defects to speed the development and production of next-generation Gate-All-Around (GAA) logic chips as well as higher-density DRAM and 3D NAND memories.
